Open Calls

HIAP Summer Residency for Finland-based Art Practitioners

Due to the current travel restrictions and the overall uncertainty caused by the coronavirus pandemic, the international residencies for the Summer Season at HIAP have been postponed. As a result, HIAP invites art practitioners living and working in Finland to apply for a residency on Suomenlinna in June–August 2020.

HIAP Residency Programme focuses on visual art but is open for art professionals from other disciplines as well. The programme offers time and space for open-ended research and experimentation, without the requirement to produce finalised pieces of work.

The call is intended primarily for artists whose work in the coming three months (June–August) requires a studio space, and who can work rather independently.

These summer residencies are not supported by a travel or working grant, nor include a production budget.

The residents will be offered a free studio-apartment on Suomenlinna World Heritage site. It is currently uncertain whether the regular residency activities of the HIAP community, including weekly informal get-togethers between staff and residents and the HIAP Open Studios event towards the end of the residency season, will run during the summer. Depending on the official restrictions that will be in effect during this period, the support from the staff and the HIAP Supporting Curators will potentially be at a distance.

The HIAP Suomenlinna Studios studios are 80 sqm each, furnished, and divided into a working space downstairs and a separate living space with bathroom and kitchenette upstairs.  The studios can accommodate up to max. three persons. Families are welcome. Pets are not allowed in the rooms.
An impression of some of the spaces you can get at www.flickr.com/photos/hiap/albums/72157708766213177

The residency period starts on 3rd or 4th June and ends on 26 August 2020.

Selection

Applications are accepted from artists and art professionals who are based in Finland (Finnish nationality is not required). Individual artists, collectives or artist duos are welcome to apply. Please note that in case of an artist duo, collective or group, the studio-apartment needs to be shared among the members.

The main criteria for the selection are the quality of the professional practice and the motivation statement. Applicants who would benefit from having a studio space during these summer months will be prioritised in the selection.

The applications will be reviewed by the HIAP Supporting Curators of the Summer Season 2020, Ali Akbar Mehta and Marianne Savallampi, currently Artistic Directors at the Museum of Impossible Forms, together with members of the HIAP staff.

The deadline for the applications is Monday, May 4, 2020 (11:59 pm, GMT +2).

The decisions will be announced by Wednesday, May 13, 2020. Please note that we are unfortunately unable to give feedback about individual applications.

Application Guidelines

To apply, applicants must submit the following by using an online application form:

  • Motivation statement
  • Short bio and a curriculum vitae
  • Portfolio / examples of previous work (optional)

Please write your application in English. Incomplete applications or applications sent by e-mail without using the online application form will not be taken into consideration.

Please note the following guidelines regarding additional material supporting your application:

  • It is advised that all the supporting material is stored online and can be downloaded via the use of hyperlinks, which are mentioned in the application. Please make sure that the links do not expire before you have received the decision of the Jury.
  • All image / video / sound samples should be stored and shared online. It is advised to use platforms such as YouTube, Vimeo, etc, so that downloading isn’t required to access the material.

Please note that due to the amount of materials received, we are unable to contact applicants upon receipt of each application, to address individual inquiries regarding submitted proposals, or to comment further upon the selection process.